| 标题 |
Resolution enhancement for high-numerical aperture extreme ultraviolet lithography by split pupil exposures: a modeling perspective |
| 网址 | |
| DOI |
10.1117/1.jmm.24.1.011002
doi
|
| 其它 |
期刊:Journal of micro/nanopatterning, materials, and metrology 作者:Andreas Erdmann; Hazem Mesilhy; Peter Evanschitzky; Gerardo Bottiglieri; Tim Brunner; et al 出版日期:2024-10-08 |
| 求助人 | |
| 下载 |
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(2025-6-4)