| 标题 |
Benefits of three-dimensional mask (M3D) effects in high-NA and hyper-NA EUV lithography |
| 网址 | |
| DOI |
10.1117/1.jmm.25.3.031607
doi
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| 其它 |
期刊:Journal of Micro/Nanopatterning, Materials, and Metrology 作者:Andreas Erdmann; Gerardo Bottiglieri; Christian Schwemmer; Peter Evanschitzky; Parul Dhagat; et al 出版日期:2026-07-06 |
| 求助人 | |
| 下载 |
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(2025-6-4)