中间层
薄脆饼
炸薯条
电子工程
计算机科学
嵌入式系统
材料科学
电气工程
工程类
蚀刻(微加工)
纳米技术
电信
图层(电子)
作者
S. Y. Hou,W. Chris Chen,Clark Hu,Christine Chiu,K. C. Ting,T. S. Lin,W. H. Wei,W.C. Chiou,V. Lin,Victor C. Y. Chang,C. T. Wang,Cheng‐Hsien Wu,Douglas Yu
标识
DOI:10.1109/ted.2017.2737644
摘要
State-of-the-art silicon interposer technology of chip-on-wafer-on-substrate (CoWoS) containing the second-generation high bandwidth memory (HBM) has been applied for the first time in fabricating high-performance wafer-level system-in-package. An ultralarge Si interposer up to 1200mm2made by a two-mask stitching process is used to form the basis of the second-generation CoWoS (CoWoS-2) to accommodate chips of logic and memory and achieve the highest possible performance. Yield challenges associated with the high warpage of such a large heterogeneous system are resolved to achieve high package yield. Compared to alternative interposer integration approaches such as chip-on-substrate, CoWoS offers more competitive design rule which results in better power consumption, transmission loss, and eye diagram. CoWoS-2 has positioned itself as a flexible 3-D IC platform for logic-memory heterogeneous integration between logic system-on-chip and HBM for various high-performance computing applications.
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