蚀刻(微加工)
材料科学
等离子体刻蚀
光探测
等离子体
兴奋剂
纳米技术
光电子学
光电探测器
物理
图层(电子)
量子力学
作者
Yubao Li,Hui-Ping Wang,Xiaolin Yang,Wei Zhang
摘要
SF 6 plasma etching was developed as a contact surface pre-treatment to achieve efficient n-doping in multilayer WSe 2 nanosheets and build lateral homojunctions exhibiting superb photovoltaic properties and self-powered wide-spectrum photodetection.
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