锗
材料科学
响应度
光电子学
异质结
光电探测器
硅
量子点
纳米线
兴奋剂
暗电流
作者
Linlin Fan,Lei Wang,Haiyan He,Deren Yang,Dongsheng Li
出处
期刊:Optics Letters
[Optica Publishing Group]
日期:2024-06-26
卷期号:49 (15): 4066-4066
摘要
Tin-doped germanium quantum dots (Sn-doped Ge QDs)-decorated hexagonal silicon nanowires (h-Si NWs) were adopted to overcome the low infrared response of silicon and the excess dark current of germanium. High-quality Sn-doped Ge QDs with a narrow bandgap can be achieved through Ge-Sn co-sputtering on silicon nanowires by reducing the contact area between heterojunction materials and Sn-induced germanium crystallization. The absorption limit of the heterostructure is extended to 2.2 µm, and it is sensitive to 375–1550 nm light at 0 V, which has optimality at 1342 nm, with a photo-to-dark current ratio of over 815, a responsivity of 0.154 A/W, and a response time of 0.93 ms. The superior performance of the Sn-doped Ge QDs/h-Si NW photodetector in multiwavelength is attractive for multi-scenario applications.
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