S055015 PIV Measurements of the Model of a Semiconductor Cleaning Equipment

The cleaning process of a silicon wafer is important in the manufacturing of semiconductors, which determines the quality of the final products crucially. In the so-called single wafer cleaning, a wafer washed with cleaning solution and rinse liquid is dried up by rotating at a high speed. We made an experimental apparatus which has a similar structure to the single wafer cleaning chamber, and measured the velocity field in the chamber by the particle image velocimetry(PI V) method.