| 标题 |
Enhanced Tunneling Electroresistance in Ferroelectric Tunnel Junctions due to the Reversible Metallization of the Barrier |
| 网址 | |
| DOI | |
| 其它 |
期刊:Physical Review Letters 作者:Xiaohui Liu; J. D. Burton; Evgeny Y. Tsymbal 出版日期:2016-05-11 |
| 求助人 | |
| 下载 |
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(2025-6-4)